Rotary vane pumps HenaLine

Rotary vane pumps HenaLine

Complete range of single-stage rotary vane pumps in various designs for low and medium vacuum applications

The HenaLine is a complete series of oil-sealed rotary vane pumps that are suitable for industrial applications, coating as well as for Research & Development. The exhaust air remains clean and oil-free thanks to the built-in oil mist separator. The HenaLine pumps are available with a pumping speed of 25 to 760 m3/h.

 
 

XN series - Multi-stage Roots Pumps for Extremely Corrosive Applications

XN series - Multi-stage Roots Pumps

The optimal solution for the most corrosive processes

The dry process pumps of the XN range are made to meet the requirements of most corrosive processes. With a range from 600 to 2,900 m3/h the XN range covers the requirements of most applications where corrosion resistance is key. This innovative technology allows reducing maintenance frequency and increases pumping lifetime. The cost of ownership is drastically reduced, as well as the tool downtime. The XN range pumps are compatible with pumps from other series.

 

ASM 306 S – helium and hydrogen sniffer leak detector

ASM 306 S – Helium and hydrogen sniffer leak detector

Easy and accurate full-time sniffing operations

Experience our new ASM 306 S helium and hydrogen sniffer leak detector from Pfeiffer Vacuum. The ASM 306 S will help you to meet your daily challenges for leakage control using sniffing measurements in emerging technology like e-mobility and hydrogen energy economy or well established applications in refrigeration and air conditioning. The ASM 306 S offers all the advantages of a proven technology regarding sensitivity, accuracy and repeatability. The ASM 306 S can be completed with a 2 years lifetime calibrated leak with both helium and/or hydrogen.

 

HiScroll – the oil-free vacuum pumps

HiScroll – the oil-free vacuum pumps

High safety at lower costs

The HiScroll series consists of three dry and hermetically sealed scroll pumps with a nominal pumping speed of 6 - 20 m3/ h. The pumps are especially characterized by their high performance when evacuating against atmosphere due to their unique features. Their powerful IPM* synchronous motors achieve an efficiency that is up to 15% higher than that of conventional drives.

The integrated two-stage gas ballast and safety valve ensure process-specific and safe operation. HiScroll pumps can be easily connected to other Pfeiffer Vacuum products (such as turbopumps or display and control units) as well as to a higher-level external controller, via RS-485 or ProfiNet. The interface enables RPM regulation, situation-specific control of the fan and monitoring of the pump performance. This helps to minimize wear and noise emissions, and ensures longer maintenance intervals.

 
 

The GSD 350 gas analyzer in 3D

The GSD 350 gas analyzer in 3D

Pfeiffer Vacuum solutions in 360°

Compact, portable benchtop devices for gas analysis at atmospheric pressure. They are used, in particular, in chemical processes, in the semiconductor industry, metallurgy, fermentation, catalysis, freeze-drying and environmental analysis.

These new analyzers offer the advantages of a low detection limit up to 100 ppb (depending on the mass range), a low gas consumption of 1–2 sccm and a quick measuring time (up to 1 ms/u).

Click through our model and learn more about our portable gas analyzers. You can choose between the OmniStar and ThermoStar. The options (corrosive gas and mass calibration unit) can be displayed interactively.

Semiconductor Fab in 3D

Semiconductor fab in 3D

The solutions from Pfeiffer Vacuum in 3D

Semiconductor fabrication takes place under clean-room conditions in the high and ultra-high vacuum range. In order to implement and guarantee such conditions, reliable vacuum equipment of premium quality is a must.

A typical semiconductor fab consists of four levels. At the top level, the cleanroom, the production line as well as special systems for contamination management are located. The level below the cleanroom – the so-called “subfloor” – is where the dry pumps for the evacuation of load-locks and transfer chambers are located. The next level below is where the cooling units, current supplies and RF-generators of the plant are located. The lowest level contains dry pumps and the exhaust gas treatment (abatement) equipment.

Explore our solutions for semiconductor fabs – in 3D and from a 360° perspective! Click through the different floors and components of our semiconductor fab model and learn which products Pfeiffer Vacuum offers to fulfill the diverse requirements!

Individual vacuum solutions for analytics

Individual vacuum solutions for analytics

Solutions from Pfeiffer Vacuum with a 360-degree view

The market for analytical instruments includes every application where a vacuum is required to carry out an analytical process.

As well as research and development, this also includes markets such as:

  • Production monitoring
  • Environmental analysis
  • Portable mass spectrometry
  • Safety inspections

Pfeiffer Vacuum develops customized solutions which are tailored to the specific requirements of its customers. There are numerous and varied possibilities. We are showing only a small selection here out of all the possible vacuum solutions available.

Experience your own particular solution specifically for analytics - in 3D and with a 360-degree view.

Click through the different levels and components of our model and discover which products Pfeiffer Vacuum can offer for your requirements.

The GSD 350 gas analyzer from Pfeiffer Vacuum

GSD 350 gas analyzers for atmospheric pressure

Experience our new OmniStar and ThermoStar GSD 350

Compact, portable benchtop devices for gas analysis at atmospheric pressure. They are used, in particular, in chemical processes, in the semiconductor industry, metallurgy, fermentation, catalysis, freeze-drying and environmental analysis.

These new analyzers offer the advantages of a low detection limit of <100 ppb (depending on the mass range), a low gas consumption of 1 - 2 sccm and a quick measuring time (up to 1 ms/u).

Process optimization for rotary vane pumps

Process optimization for rotary vane pumps

Solutions, taking the Duo 65 as an example

Rotary vane pumps are subjected to severe stress by certain process gases and operating modes. Optimal protection for the pump can be provided by using auxiliary gases. The combination of gas ballast and flushing gas in this form is available only from Pfeiffer Vacuum.

Gas ballast is used primarily in drying, freeze-drying and distillation applications. Flushing gas is the preferred choice for severe loading cases, corrosive applications and all processes that use aggressive media.

If corrosion is prevented, the pump has a longer service life. Longer intervals between oil changes also result in a reduction in costs.

Functional principle of the HiPace turbopump

Functional principle of the HiPace turbopump in 3D

Take a look inside the turbopump

Up to 90,000 rotations per minute, almost speed of sound at the outer radius, vacuum conditions of up to 10 -11 mbar — our turbopumps convince with their performance and reliability.

Accompany the gas molecules on their journey through the turbopump in 3D and learn the functional principle as well as the design of the HiPace from Pfeiffer Vacuum!

High performance Roots pump HiLobe

High performance HiLobe Roots pumps in 3D

New high performance Roots pump HiLobe in 3D

These innovative Roots pumps offer a nominal pumping speed range of 520 - 2,100 m³/h and can be perfectly adjusted to customer-specific requirements.

Functional principle of the OktaLine Roots pump

View inside the OktaLine from Pfeiffer Vacuum

Functional principle of the OktaLine Roots in 3D

Take a look inside the Roots pump from Pfeiffer Vacuum! Learn about the pump components in this 3D sectional model and follow the gas molecules on their way through the OktaLine.

Explore the functional principle and the Roots design.

Functional principle of the A4 multi-stage Roots pump

3D view inside the A4 series

Design and function of the multi-stage Roots pumps from Pfeiffer Vacuum

The processes in the semiconductor industry always provide new challenges for the installed vacuum pumps. The A4 series is based on the proven, energy-efficient multi-stage Roots technology from Pfeiffer Vacuum.

Take a look at what happens inside the pump and follow the gas molecules on their way!

ISO-KF flange system in 3D

ISO-KF flange system from Pfeiffer Vacuum in 3D

Pfeiffer Vacuum manufactures the ISO-KF flange system according to DIN 28403 and ISO 2861.

Explore the designs, the components as well as the functional principle of the ISO-KF flange systems from Pfeiffer Vacuum in a 3D perspective!

Diaphragm pump MVP from Pfeiffer Vacuum in 3D

The MVP diaphragm pump in 3D

Compact design, easy integration into existing systems – the diaphragm pumps from Pfeiffer Vacuum convince with their small footprint. Explore the pump from inside in 3D, learn more about its components and its function!

Rotary vane pump of the DuoLine in 3D

Take a look inside the DuoLine

Rotary vane pump in 3D

Light, compact, powerful – the rotary vane pumps of the DuoLine from Pfeiffer Vacuum are the smallest in their pumping speed spectrum on the market.

Explore the design of the pumps and follow the molecules on their way in 3D!

ISO-K and ISO-F flange systems

ISO-K and ISO-F flange systems

Experience the design, components and functional principle of ISO-K and ISO-F flange systems from Pfeiffer Vacuum in 3D!

PrismaPro quadrupole mass spectrometer in 3D

Functional principle of the PrismaPro quadrupole mass spectrometer

Experience the function and design of the PrismaPro quadrupole mass spectrometer with Faraday and C-SEM detector from Pfeiffer Vacuum. Follow the molecules on their way through the analyzer of the PrismaPro and learn how residual gas analysis is performed in high vacuum!

New leak detectors ASM 390 and ASM 392 in 3D!

Leak detectors ASM 390 and ASM 392 in 3D

Rapid pump down time, high sensitivity, accurate results and minimal detection time: The ASM 390 and ASM 392 are the perfect solution for the semiconductor and the display industries as well as for other demanding applications.

A frictionless backing pump, a powerful high vacuum pump – they are ideal for leak testing in clean environments.

Speed up your leak detection process to reduce the downtime of your production equipment with the ASM 392 – it comes with an additional turbopump!

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